Training on Static Charge effect to the Reticles at SEMICON WEST July 14th at 1.30pm - Training given by Gavin Rider (Microtome Precision) and Arnie Steinman (MKS Ions Systems) "Is static charge killing your reticles and profits ?" EFM : A Pernicious Threat to Reticles - Future Fab Intl Issue 25 please read this article by Gavin Rider from Microtome Precision "EFM: a Pernicious Threat to Reticles" Release of Lithoware from KLA Tencor LithoWare bridges R&D lithography and OPC/RET engineering LithoWare information Benchmark PSFM Data! announced Benchmark Technologies released its PSFM Data! analysis software to support its Phase Shift Focus Monitor. Press Release